Shimadzu TMP-303LMC (A1) Magnetically Levitated Turbomolecular Pump
The Shimadzu TMP-303LMC (A1) is a high-throughput, magnetically levitated turbomolecular vacuum pump engineered specifically to handle both clean R&D processes and aggressive corrosive gas loads. Featuring an advanced 5-axis active magnetic bearing suspension system, this pump completely eliminates mechanical friction, oil lubrication, and the risk of hydrocarbon back-streaming, ensuring an ultra-pure, contamination-free vacuum environment.
The "LMC" designation indicates that this model is equipped with specialized anti-corrosion rotor coatings (typically nickel plating), making it exceptionally durable against highly reactive chemical processes used in semiconductor manufacturing, plasma etching, CVD, and thin-film deposition.
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Active Magnetic Bearings: 5-axis levitation prevents contact wear, eliminates routine bearing maintenance, and ensures zero chemical degradation of lubricants.
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Corrosive Gas Protection: Nickel-plated rotor blades and internal structural shielding resist chemical attack from aggressive process gases.
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High Pumping Throughput: Delivers consistent, class-leading pumping speeds up to 320 L/s for Nitrogen (N2).
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Flexible Mounting Configuration: The absence of a liquid oil reservoir allows the pump to be mounted and operated in any physical orientation.
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Ultra-Low Vibration: Active position sensors continually balance the rotor dynamically, keeping mechanical harmonics to an absolute minimum.
Technical Specifications
| Parameter | Specification |
|---|---|
| Manufacturer | Shimadzu Corporation (Japan) |
| Model Number | TMP-303LMC (Revision A1 Variant) |
| Pumping Speed (N2) | 320 L/s (300 L/s with protective net screen installed) |
| Pumping Speed (He / H2) | 340 L/s / 320 L/s |
| High-Vacuum Inlet Flange Options | VG100 / ICF152 / ISO 100-B / ISO 100-C |
| Foreline / Backing Connection | DN 25 KF (NW25) |
| Compression Ratio (N2) | 1×109 |
| Ultimate Pressure | ≤10−7 Pa order (Corrosive series baseline) |
| Rated Speed | 45,000 RPM |
| Start-up / Ramp-up Time | ≤5 minutes |
| Cooling Method | Water Cooled (1 to 3 L/min flow rate requirement) |
| Purge Gas Flow Rate | Recommended 20 to 30 mL/min (SCCM) |
| Compatible Controllers | Shimadzu EI-S04M / EI-D303M power supply units |
| Weight | 14 kg (31.0 lbs) |
Applications & Compatibility
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Semiconductor Processing (Etch, CVD, Ashing)
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Corrosive Gas R&D Experiments
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Ion Beam and Electron Beam Instrumentation
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Industrial Surface Coatings & Vacuum Metallurgy
- Regular price
- $6,499.00
- Sale price
- $6,499.00
- Regular price
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- Unit price
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