Pfeiffer

Pfeiffer TPH 521 P C Turbomolecular Pump

Part Number: PMP03863D
Condition: Refurbished
In Stock

The Pfeiffer Vacuum TPH 521 P C is a heavy-duty, high-performance turbomolecular pump specifically engineered for corrosive, high-throughput gas processes in semiconductor wafer fabrication, industrial coating, and analytical research systems. Featuring robust mechanical ceramic ball bearings and a corrosive-gas protected design ("C" series with process purge gas capability), it delivers high pumping speeds and excellent compression ratios for light gases like Hydrogen and Helium. Its rugged construction provides long operational lifetime and dependable high-vacuum performance under demanding continuous load conditions.

Technical Specifications

Parameter Specification Details
Part Number PM P03 863 D
Inlet Flange DN 160 ISO-K / DN 160 CF
Outlet Flange DN 25 ISO-KF (KF25)
Purge / Vent Connection G 1/8" / Hose Nipple
Pumping Speed (N2) ~500 L/s
Pumping Speed (Ar) ~500 L/s
Pumping Speed (H2) ~490 L/s
Bearing System Hybrid Ceramic Ball Bearing with Gas Purge Protection
Cooling Method Water Cooled (Recommended for corrosive/process gas)
Compatible Controller Pfeiffer TCP 380 / TCP 600 Series Drive Units
Dimensions Approx. 12.2" H x 9.8" Outer Diameter (310 mm x 250 mm)
Weight ~61.7 lbs (28 kg)

Target Applications

  • Semiconductor Processing (Plasma Etch, CVD, PVD, Reactive Sputtering)

  • Industrial Thin-Film Coating & Vacuum Metallurgy

  • Solar Cell & Photovoltaic Layer Manufacturing

  • Mass Spectrometry & Analytical Process Monitoring

  • Ultra-High Vacuum (UHV) Research Chambers

$4,985.00
$4,985.00
Shipping calculated at checkout.
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