Edwards STP-F2203C Turbomolecular Pump
The Edwards (Seiko Seiki) STP-F2203C is a high-capacity, magnetically levitated turbomolecular pump engineered for demanding high-throughput semiconductor and thin-film processes. Featuring advanced rotor blade geometry and a 5-axis active magnetic bearing system, it provides hydrocarbon-free high vacuum with zero mechanical friction, ensuring low vibration and maintenance-free continuous operation. The chemical process variant ("C" series) features specialized coatings and corrosive gas protection, making it ideal for aggressive etch, chemical vapor deposition (CVD), and ion implantation applications.
Technical Specifications
| Parameter | Specification Details |
|---|---|
| Part Number | PT50-0Z-006 |
| Inlet Flange | VG250 (ISO-250F) |
| Outlet Flange | KF-40 (NW40) |
| Pumping Speed (N2) | 2,200 L/s |
| Pumping Speed (H2) | 1,200 L/s |
| Bearing System | 5-Axis Active Magnetic Levitation |
| Rated Speed | 27,000 RPM |
| Cooling Method | Water Cooled |
| Mounting Orientation | Any Direction / Universal |
| Compatible Controller | Edwards SCU-1400 / SCU-1500 Series |
| Dimensions | Approx. 18.5" H x 13.8" Outer Diameter (470 mm x 350 mm) |
| Weight | ~134.5 lbs (61 kg) |
Target Applications
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Semiconductor Wafer Manufacturing (Plasma Etch, CVD, PVD, Ion Implantation)
-
Industrial Surface Coating & Thin-Film Deposition
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Flat Panel Display (FPD) Vacuum Systems
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Solar & Photovoltaic Cell Production
-
Ultra-High Vacuum (UHV) Research Facilities
- Regular price
- $15,495.00
- Sale price
- $15,495.00
- Regular price
-
- Unit price
- / per
