CTI-Cryogenics IS-320F Cryopump

The CTI IS-320F Cryopump (Part Number: E31055345) is a high-performance, flat-profile cryogenic vacuum pump designed for demanding industrial, semiconductor, and high-vacuum research applications. Engineeed by CTI-Cryogenics (Brooks Automation), the IS-320F delivers reliable, hydrocarbon-free ultra-high vacuum (UHV) pumping speeds for water vapor, air, argon, and light gases. Its compact, low-profile horizontal/flat configuration allows for direct mounting where vertical clearance is limited.

Key Features

• High Pumping Speed & Capacity: Optimized arrays deliver rapid drawdown and exceptional crossover pressures for water vapor, hydrogen, helium, and atmospheric gases.

• Hydrocarbon-Free Vacuum: Clean cryogenic trapping eliminates oil backstreaming risks, protecting critical vacuum processes and substrates.

• Low-Profile Design: Flat-mounting geometry minimizes spatial footprint in tight system architectures and OEM integrations.

• Robust Thermal Efficiency: Compatible with standard CTI helium compressors (such as 8200, 8500, or 9600 series) to ensure thermal stability under heavy gas loads.

• Low Maintenance Operation: Extended duty cycles between regeneration cycles maximize equipment uptime and operational reliability.

Technical Specifications

Common Applications

• Semiconductor Processing: Physical Vapor Deposition (PVD), Sputtering, and Ion Implantation chambers.

• Thin-Film Deposition: Optical coating, solar cell manufacturing, and web coating systems.

• Surface Analysis & Vacuum Research: Electron microscopy, surface science instrumentation, and space simulation chambers.

• Industrial Vacuum: Furnace evacuating and high-purity thermal process chambers.