{"product_id":"pfeiffer-tph-521-p-c-turbomolecular-pump","title":"Pfeiffer TPH 521 P C Turbomolecular Pump","description":"\u003cp\u003eThe Pfeiffer Vacuum TPH 521 P C is a heavy-duty, high-performance turbomolecular pump specifically engineered for corrosive, high-throughput gas processes in semiconductor wafer fabrication, industrial coating, and analytical research systems. Featuring robust mechanical ceramic ball bearings and a corrosive-gas protected design (\"C\" series with process purge gas capability), it delivers high pumping speeds and excellent compression ratios for light gases like Hydrogen and Helium. Its rugged construction provides long operational lifetime and dependable high-vacuum performance under demanding continuous load conditions.\u003c\/p\u003e\n\u003ch3\u003eTechnical Specifications\u003c\/h3\u003e\n\u003cdiv class=\"horizontal-scroll-wrapper\"\u003e\n\u003cdiv class=\"table-block-component\"\u003e\n\u003cdiv class=\"table-block has-export-button new-table-style is-at-scroll-start is-at-scroll-end\"\u003e\n\u003cdiv class=\"table-content md-content\"\u003e\n\u003ctable\u003e\n\u003cthead\u003e\n\u003ctr\u003e\n\u003cth\u003e\u003cspan\u003eParameter\u003c\/span\u003e\u003c\/th\u003e\n\u003cth\u003e\u003cspan\u003eSpecification Details\u003c\/span\u003e\u003c\/th\u003e\n\u003c\/tr\u003e\n\u003c\/thead\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003ePart Number\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003ePM P03 863 D\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003eInlet Flange\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003eDN 160 ISO-K \/ DN 160 CF\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003eOutlet Flange\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003eDN 25 ISO-KF (KF25)\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003ePurge \/ Vent Connection\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003eG 1\/8\" \/ Hose Nipple\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003ePumping Speed (N2)\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003e~500 L\/s\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003ePumping Speed (Ar)\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003e~500 L\/s\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003ePumping Speed (H2)\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003e~490 L\/s\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003eBearing System\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003eHybrid Ceramic Ball Bearing with Gas Purge Protection\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003eCooling Method\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003eWater Cooled (Recommended for corrosive\/process gas)\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003eCompatible Controller\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003ePfeiffer TCP 380 \/ TCP 600 Series Drive Units\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003eDimensions\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003eApprox. 12.2\" H x 9.8\" Outer Diameter (310 mm x 250 mm)\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cspan\u003e\u003cb\u003eWeight\u003c\/b\u003e\u003c\/span\u003e\u003c\/td\u003e\n\u003ctd\u003e\u003cspan\u003e~61.7 lbs (28 kg)\u003c\/span\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003ch3\u003e\u003c\/h3\u003e\n\u003ch3\u003eTarget Applications\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cp\u003eSemiconductor Processing (Plasma Etch, CVD, PVD, Reactive Sputtering)\u003c\/p\u003e\n\u003c\/li\u003e\n\u003cli\u003e\n\u003cp\u003eIndustrial Thin-Film Coating \u0026amp; Vacuum Metallurgy\u003c\/p\u003e\n\u003c\/li\u003e\n\u003cli\u003e\n\u003cp\u003eSolar Cell \u0026amp; Photovoltaic Layer Manufacturing\u003c\/p\u003e\n\u003c\/li\u003e\n\u003cli\u003e\n\u003cp\u003eMass Spectrometry \u0026amp; Analytical Process Monitoring\u003c\/p\u003e\n\u003c\/li\u003e\n\u003cli\u003e\n\u003cp\u003eUltra-High Vacuum (UHV) Research Chambers\u003c\/p\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e","brand":"Pfeiffer","offers":[{"title":"Default Title","offer_id":47983768305853,"sku":null,"price":4985.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0662\/1016\/9021\/files\/PfeifferTPH521PC_1.jpg?v=1786573423","url":"https:\/\/labvac.com\/products\/pfeiffer-tph-521-p-c-turbomolecular-pump","provider":"Labvac","version":"1.0","type":"link"}